Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.
 Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.
 Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.
 Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.
 Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.
 Mahamdi R, Saci L, Mansour F, Temple-Boyer P, Scheid E, Jalabert L. 
Boron diffusion and activation in polysilicon multilayer films for P+ MOS structure: Characterization and modeling. Microelectronics journalMicroelectronics Journal.  2009;40 :1-4.