@article {61803,
	title = {Boron diffusion and activation during heat treatment in heavily doped polysilicon thin films for P+ metal-oxide-semiconductor transistors gates},
	journal = {Japanese journal of applied physicsJapanese Journal of Applied Physics},
	volume = {40},
	year = {2001},
	month = {2001},
	pages = {6723},
	isbn = {1347-4065},
	author = {Mahamdi, Ramdane and Mansour, Farida and Scheid, Emmanuel and Boyer, Pierre Temple and Jalabert, Laurent}
}
