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size="100%">2012</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2012</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">1</style></number><volume><style face="normal" font="default" size="100%">12</style></volume><pages><style face="normal" font="default" size="100%">1453-1456</style></pages><isbn><style face="normal" font="default" size="100%">1303-0914</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Bouridah, Hachemi</style></author><author><style face="normal" font="default" size="100%">Bouaziz, Fatiha</style></author><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Mahamdi, 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size="100%">1369-8001</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Saci, Lynda</style></author><author><style face="normal" font="default" size="100%">Mahamdi, Ramdane</style></author><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Boucher, Jonathan</style></author><author><style face="normal" font="default" size="100%">Collet, Maeva</style></author><author><style face="normal" font="default" size="100%">Pereira, Elena Bedel</style></author><author><style face="normal" font="default" size="100%">Temple-Boyer, Pierre</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Study of nitrogen effect on the boron diffusion during heat treatment in polycrystalline silicon/nitrogen-doped silicon thin films</style></title><secondary-title><style face="normal" font="default" size="100%">Japanese Journal of Applied PhysicsJapanese Journal of Applied Physics</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2011</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2011</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">5R</style></number><volume><style face="normal" font="default" size="100%">50</style></volume><pages><style face="normal" font="default" size="100%">051301</style></pages><isbn><style face="normal" font="default" size="100%">1347-4065</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>10</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Bouridah, Hachemi</style></author><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Mahamdi, Ramdane</style></author><author><style face="normal" font="default" size="100%">Temple-Boyer, Pierre</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Effect of Nitrogen on Boron doped Polysilicon Thin Films Properties</style></title><secondary-title><style face="normal" font="default" size="100%">2007 IEEE International Symposium on Industrial Electronics</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2007</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2007</style></date></pub-dates></dates><publisher><style face="normal" font="default" size="100%">IEEE</style></publisher><pages><style face="normal" font="default" size="100%">1346-1349</style></pages><isbn><style face="normal" font="default" size="100%">1-4244-0754-0</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Bouridah, Hachemi</style></author><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Mahamdi, Ramdane</style></author><author><style face="normal" font="default" size="100%">Temple-Boyer, Pierre</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of materials scienceJournal of materials science</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2005</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">6</style></number><volume><style face="normal" font="default" size="100%">40</style></volume><pages><style face="normal" font="default" size="100%">1405-1408</style></pages><isbn><style face="normal" font="default" size="100%">1573-4803</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Mahamdi, Ramdane</style></author><author><style face="normal" font="default" size="100%">Jalabert, 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size="100%">eng</style></language></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Mahamdi, Ramdane</style></author><author><style face="normal" font="default" size="100%">Mansour, Farida</style></author><author><style face="normal" font="default" size="100%">Scheid, Emmanuel</style></author><author><style face="normal" font="default" size="100%">Boyer, Pierre Temple</style></author><author><style face="normal" font="default" size="100%">Jalabert, Laurent</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Boron diffusion and activation during heat treatment in heavily doped polysilicon thin films for P+ metal-oxide-semiconductor transistors gates</style></title><secondary-title><style face="normal" font="default" size="100%">Japanese journal of applied physicsJapanese Journal of Applied 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