Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content

Citation:

Bouridah H, Mansour F, Mahamdi R, Temple-Boyer P. Study of electrical and structural properties of boron doped polysilicon films with a low nitrogen content. Journal of materials scienceJournal of materials science. 2005;40 :1405-1408.

Date Published:

2005

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