Study of nitrogen effect on the boron diffusion during heat treatment in polycrystalline silicon/nitrogen-doped silicon thin films

Citation:

Saci L, Mahamdi R, Mansour F, Boucher J, Collet M, Pereira EB, Temple-Boyer P. Study of nitrogen effect on the boron diffusion during heat treatment in polycrystalline silicon/nitrogen-doped silicon thin films. Japanese Journal of Applied PhysicsJapanese Journal of Applied Physics. 2011;50 :051301.

Date Published:

2011

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