Examines the market for wireless sensor networks in the era and expansion of the Internet of Things. Over the past decade, the fast expansion of the Internet of Things (IoT) paradigm and wireless communication technologies has raised many scientific and engineering challenges that call for ingenious research efforts from both academia and industry. The IoT paradigm now covers several technologies beyond RFID and wireless sensor networks (WSNs). In fact, the number of potential application fields has already exceeded expectations. According to Cisco IBSG, more than 50 billion devices are expected to be connected to the Internet by 2020, with around 20 percent from the industry sector. Therefore, integrating the IoT concept and industrial WSNs (IWSNs) is an attractive choice for industrial processes, which may optimize operational efficiency, automation, maintenance, and rationalization. Moreover, IoT ensures large-scale interconnection between machines, computers, and people, enabling intelligent industrial operations. This emergent technological evolution has led to what has become the Industrial IoT (IIoT). IIoT will bring promising opportunities, along with new challenges.

Examines the market for wireless sensor networks in the era and expansion of the Internet of Things. Over the past decade, the fast expansion of the Internet of Things (IoT) paradigm and wireless communication technologies has raised many scientific and engineering challenges that call for ingenious research efforts from both academia and industry. The IoT paradigm now covers several technologies beyond RFID and wireless sensor networks (WSNs). In fact, the number of potential application fields has already exceeded expectations. According to Cisco IBSG, more than 50 billion devices are expected to be connected to the Internet by 2020, with around 20 percent from the industry sector. Therefore, integrating the IoT concept and industrial WSNs (IWSNs) is an attractive choice for industrial processes, which may optimize operational efficiency, automation, maintenance, and rationalization. Moreover, IoT ensures large-scale interconnection between machines, computers, and people, enabling intelligent industrial operations. This emergent technological evolution has led to what has become the Industrial IoT (IIoT). IIoT will bring promising opportunities, along with new challenges.

Examines the market for wireless sensor networks in the era and expansion of the Internet of Things. Over the past decade, the fast expansion of the Internet of Things (IoT) paradigm and wireless communication technologies has raised many scientific and engineering challenges that call for ingenious research efforts from both academia and industry. The IoT paradigm now covers several technologies beyond RFID and wireless sensor networks (WSNs). In fact, the number of potential application fields has already exceeded expectations. According to Cisco IBSG, more than 50 billion devices are expected to be connected to the Internet by 2020, with around 20 percent from the industry sector. Therefore, integrating the IoT concept and industrial WSNs (IWSNs) is an attractive choice for industrial processes, which may optimize operational efficiency, automation, maintenance, and rationalization. Moreover, IoT ensures large-scale interconnection between machines, computers, and people, enabling intelligent industrial operations. This emergent technological evolution has led to what has become the Industrial IoT (IIoT). IIoT will bring promising opportunities, along with new challenges.

Examines the market for wireless sensor networks in the era and expansion of the Internet of Things. Over the past decade, the fast expansion of the Internet of Things (IoT) paradigm and wireless communication technologies has raised many scientific and engineering challenges that call for ingenious research efforts from both academia and industry. The IoT paradigm now covers several technologies beyond RFID and wireless sensor networks (WSNs). In fact, the number of potential application fields has already exceeded expectations. According to Cisco IBSG, more than 50 billion devices are expected to be connected to the Internet by 2020, with around 20 percent from the industry sector. Therefore, integrating the IoT concept and industrial WSNs (IWSNs) is an attractive choice for industrial processes, which may optimize operational efficiency, automation, maintenance, and rationalization. Moreover, IoT ensures large-scale interconnection between machines, computers, and people, enabling intelligent industrial operations. This emergent technological evolution has led to what has become the Industrial IoT (IIoT). IIoT will bring promising opportunities, along with new challenges.

In this paper we have developed an algorithm of boron diffusion after thermal annealing in a highly doped polysilicon film. This algorithm takes into account electrically active point defects by associating some parameters such as boron solubility limit and diffusion coefficient. We have studied effect of annealing temperature in order to perform impact of this parameter on maximum depth diffusion of junction and maximum of concentration by analysis of Secondary Ion Mass Spectrometry (SIMS) profiles. In fact we have proposed numerical model based on Fick’s equation, resolved by finite difference method under Matlab also we have simulated this phenomenon by Silvaco software.

In this paper we have developed an algorithm of boron diffusion after thermal annealing in a highly doped polysilicon film. This algorithm takes into account electrically active point defects by associating some parameters such as boron solubility limit and diffusion coefficient. We have studied effect of annealing temperature in order to perform impact of this parameter on maximum depth diffusion of junction and maximum of concentration by analysis of Secondary Ion Mass Spectrometry (SIMS) profiles. In fact we have proposed numerical model based on Fick’s equation, resolved by finite difference method under Matlab also we have simulated this phenomenon by Silvaco software.

In this paper we have developed an algorithm of boron diffusion after thermal annealing in a highly doped polysilicon film. This algorithm takes into account electrically active point defects by associating some parameters such as boron solubility limit and diffusion coefficient. We have studied effect of annealing temperature in order to perform impact of this parameter on maximum depth diffusion of junction and maximum of concentration by analysis of Secondary Ion Mass Spectrometry (SIMS) profiles. In fact we have proposed numerical model based on Fick’s equation, resolved by finite difference method under Matlab also we have simulated this phenomenon by Silvaco software.